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Volumn 23, Issue 20, 1998, Pages 1609-1611

Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region

Author keywords

[No Author keywords available]

Indexed keywords


EID: 3743122911     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.23.001609     Document Type: Article
Times cited : (110)

References (15)
  • 3
    • 0000785539 scopus 로고    scopus 로고
    • G. Kubiak and D. Kania, eds., Trends in Optics and Photonics Series Optical Society of America, Washington, D.C.
    • J. Underwood, in Extreme Ultraviolet Lithography, G. Kubiak and D. Kania, eds., Vol. 4 of Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 1996), pp. 162-166.
    • (1996) Extreme Ultraviolet Lithography , vol.4 , pp. 162-166
    • Underwood, J.1
  • 5
    • 0010905592 scopus 로고
    • F. Zernike and D. Atwood, eds., OSA Proceedings Series Optical Society of America, Washington, D.C.
    • P. Rockett, J. Hunter, G. Kubiak, K. Krenz, H. Shields, and M. Powers, in Extreme Ultraviolet Lithography, F. Zernike and D. Atwood, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1995), pp. 255-259.
    • (1995) Extreme Ultraviolet Lithography , vol.23 , pp. 255-259
    • Rockett, P.1    Hunter, J.2    Kubiak, G.3    Krenz, K.4    Shields, H.5    Powers, M.6
  • 10
    • 3743132278 scopus 로고    scopus 로고
    • G. Kubiak and B. Kania, eds., Trends in Optics and Photonics Series Optical Society of America, Washington, D.C.
    • M. McGeoch, in Extreme Ultraviolet Lithography, G. Kubiak and B. Kania, eds., Vol.4 of Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 1996), pp. 84-88.
    • (1996) Extreme Ultraviolet Lithography , vol.4 , pp. 84-88
    • McGeoch, M.1
  • 12
    • 84975590985 scopus 로고
    • A. Hawryluk and R. Stulen, eds., OSA Proceedings Series Optical Society of America, Washington, D.C.
    • R. Spitzer, R. Kauffman, T. Orzechowski, B. Phillion, and C. Cerjan, in Soft-X-Ray Projection Lithography, A. Hawryluk and R. Stulen, eds., Vol. 18 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1993), pp. 142-145.
    • (1993) Soft-X-Ray Projection Lithography , vol.18 , pp. 142-145
    • Spitzer, R.1    Kauffman, R.2    Orzechowski, T.3    Phillion, B.4    Cerjan, C.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.