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Volumn 21, Issue 6, 2003, Pages 2843-2847
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Laser-produced-plasma light source development for extreme ultraviolet lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHARGE COUPLED DEVICES;
LASER PRODUCED PLASMAS;
LASER PULSES;
LIGHT SOURCES;
MIRRORS;
NEODYMIUM LASERS;
OPTIMIZATION;
POWER AMPLIFIERS;
X RAY PHOTOELECTRON SPECTROSCOPY;
XENON;
CONVERSION EFFICIENCY;
LASER SPOT SIZE;
PHOTOLITHOGRAPHY;
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EID: 0942289220
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.162781310.1116/1.1627813 Document Type: Article |
Times cited : (24)
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References (9)
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