메뉴 건너뛰기




Volumn 21, Issue 6, 2003, Pages 2843-2847

Laser-produced-plasma light source development for extreme ultraviolet lithography

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARGE COUPLED DEVICES; LASER PRODUCED PLASMAS; LASER PULSES; LIGHT SOURCES; MIRRORS; NEODYMIUM LASERS; OPTIMIZATION; POWER AMPLIFIERS; X RAY PHOTOELECTRON SPECTROSCOPY; XENON;

EID: 0942289220     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.162781310.1116/1.1627813     Document Type: Article
Times cited : (24)

References (9)
  • 9
    • 85010813292 scopus 로고    scopus 로고
    • CD file, 08-Exulite presentation-Fay.pdf (Santa Clara, February)
    • B. Fay, EUV Source Workshop, CD file, 08-Exulite presentation-Fay.pdf (Santa Clara, February 2003).
    • (2003) EUV Source Workshop
    • Fay, B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.