Optical and transport studies on thin microcrystalline silicon films prepared by very high frequency glow discharge for solar cell applications

Journal of Applied Physics

Volumn 81, Issue 11, 1997, Pages 7376-7385

  Tzolov, M ^a   Finger, F ^b   Carius, R ^b   Hapke, P ^b  

^a CTRL LAB SOLAR ENER NEW ENER S   (Bulgaria)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; FILM GROWTH; GLOW DISCHARGES; INFRARED SPECTROSCOPY; NATURAL FREQUENCIES; OPTICAL PROPERTIES; OPTICAL VARIABLES MEASUREMENT; PHOSPHORUS; PLASMAS; RAMAN SPECTROSCOPY; SOLAR CELLS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA EXCITATION FREQUENCY;

SEMICONDUCTING SILICON;

EID: 0031168978     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365354     Document Type: Article

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