High rate growth of microcrystalline silicon by VHF-GD at high pressure

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 37-40

  Graf, U ^a   Meier, J ^a   Kroll, U ^a   Bailat, J ^a   Droz, C ^a   Vallat Sauvain, E ^a   Shah, A ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

High rate deposition; Thin film microcrystalline silicon layers; VHF GD

Indexed keywords

CRYSTALLINE MATERIALS; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES; SOLAR CELLS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

MICROCRYSTALLINE SILICON;

SILICON;

EID: 0037416679     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01178-1     Document Type: Conference Paper

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