Kinetics of power deposition and silane dissociation in radio-frequency discharges

Journal of the Electrochemical Society

Volumn 144, Issue 2, 1997, Pages 634-640

  Spiliopoulos, N ^a   Mataras, D ^a   Rapakoulias, D E ^a  

^a UNIVERSITY OF PATRAS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DEPOSITION; DISSOCIATION; ELECTRODES; ELECTRONS; MOLECULES; SILANES;

POWER DEPOSITION; RADIO FREQUENCY DISCHARGE; SILANE DISSOCIATION;

REACTION KINETICS;

EID: 0031075322     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837459     Document Type: Article

References (43)

1. A. Gallagher, J. Appl. Phys., 63, 2406 (1988).
2. S. Veprek, Thin Solid Films, 175, 129 (1989).
3. N. Itabashi, N. Nishiwaki, M. Magane, S. Naito, T. Goto, A. Matsuda, C. Yamada, and E. Hirota, Jpn. J. Appl. Phys., 29, L505 (1990).
4. D. Mataras, S. Cavadias, and D. Rapakoulias, J. Appl. Phys., 66, 119 (1989).
5. J. P. M. Schmitt, P. Gressier, M. Krishnan, G. De Rosny, and J. Perrin, Chem. Phys., 84, 281 (1984).
6. R. M. Roth, K. G. Spears, and G. Wong, Appl. Phys. Lett., 45, 28 (1984).
7. G. Turban, B. Drevillon, D. Mataras, and D. E. Rapakoulias, in Plasma Deposition of Amorphous Silicon-Based Materials, G. Bruno, P. Capezzuto, and A. Madan, Academic Press, Inc., San Diego, CA (1995).
8. R. Robertson and A. Gallagher, J. Appl. Phys., 59, 3402 (1986).
9. D. Mataras, F. Coutelieris, P. Kounavis, and D. E. Rapakoulias, J. Phys. D: Appl. Phys., 29, 2452 (1996).
10. M. J. Kushner, J. Appl. Phys., 63, 2532 (1988).
11. J. Perrin, J. Phys. D: Appl. Phys., 26, 1662 (1993).
12. G. Nolet, This Journal, 122, 1030 (1975).
13. P. A. Longeway, R. D. Estes, and H. A. Weakliem, J. Phys. Chem., 88, 73 (1984).
14. N. Spiliopoulos, D. Mataras, and D. Rapakoulias, in Proceedings of 12th International Symposium on Plasma Chemistry, Vol. 4, J. V. Heberlein, D. W. Ernie, and J. T. Roberts, Editors, p. 2143, University of Minnesota, Minneapolis, MN (1995).
15. N. Spiliopoulos, S. Stamou, D. Mataras, and D. Rapakoulias, ibid., p. 1927.
16. N. Spiliopoulos, S. Stamou, D. Mataras, and D. Rapakoulias, in Proceedings of 13th EC Photovoltaic Solar Energy Conference, Vol. 1, W. Freiesleben, W. Palz, H. A. Ossenbrink, and P. Helm, Editors, p. 292, H. S. Stephens and Associates, Nice, France (1995).
17. N. Spiliopoulos, D. Mataras, and D. E. Rapakoulias, J. Vac. Sci. Technol., AXX, 000 (1996).
18. G. Turban, Y. Catherine, and B. Grolleau, Thin Solid films, 60, 147 (1979).
19. P. E. Vanier, F. J. Kampas, R. R. Corderman, and G. Rajeswaran, J. Appl. Phys., 56, 1812 (1984).
20. J. P. Boeuf and Ph. Belenguer, ibid., 71, 4751 (1992).
21. M. A. Sobolewski, IEEE Trans. Plasma Sci., PS-23, 1006 (1995).
22. P. A. Longeway, H. A. Weakliem, and R. D. Estes, J. Appl. Phys., 57, 5499 (1985).
23. M. J. Kushner, IEEE Trans. Plasma Sci., PS-14, 188 (1986).
24. V. A. Godyak and A. S. Khanneh, ibid., PS-14, 112 (1986).
25. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, J. Appl. Phys., 69, 3455 (1991).
26. Ph. Belenguer and J. P. Boeuf, Phys. Rev. A., 41, 4447 (1990).
27. C. Beneking, J. Appl. Phys., 68, 4461 (1990).
28. O. A. Popov and V. A. Godyak, ibid., 57, 53 (1985).
29. T. Kimura and K. Ohe, J. Phys. D: Appl. Phys., 27, 1465 (1994).
30. K. Behringer and U. Fantz, ibid., 27, 2128 (1994).
31. J. W. Butterbaugh, L. D. Baston, and H. H. Sawin, J. Vac. Sci. Technol., A8, 916 (1990).
32. L. Sansonnens, D. Franz, Ch. Hollenstein, A. A. Howling, J. Schmitt, E. Turlot, T. Emeraud, U. Kroll, J. Meier, and A. Shah, in Proceedings of 13th EC Photovoltaic Solar Energy Conference, Vol. 1, W. Freiesleben, W. Palz, H. A. Ossenbrink, and P. Helm, Editors, p. 276, H. S. Stephens and Associates, Nice, France (1995).
33. J. Perrin and T. Broekhuizen, Appl. Phys. Lett., 50, 433 (1987).
34. J. Perrin, in Plasma Deposition of Amorphous Silicon-Based Materials, G. Bruno, P Capezzuto, and A. Madan, Editors, pp. 177-241, Academic Press, Inc., San Diego, CA (1995).
35. D. Mataras and D. E. Rapakoulias, Mater. Manuf. Processes, 7, 561 (1992).
36. D. Mataras, S. Cavadias, and D. Rapakoulias, Mater. Res. Soc. Symp. Proc., 165, 55 (1990).
37. P. Kounavis, D. Mataras, N. Spiliopoulos, E. Mytilineou, and D. Rapakoulias, J. Appl. Phys., 75, 1599 (1994).
38. D. Mataras, S. Cavadias, and D. Rapakoulias, J. Vac. Sci. Technol., A11, 664 (1993).
39. C. G. Goedde, A. J. Lichtenberg, and M. A. Lieberman, J. Appl. Phys., 64, 4375 (1988).
40. C. Böhm and J. Perrin, J. Phys. D: Appl. Phys., 24, 865 (1991).
41. J. R. Doyle, D. A. Daughty, and A. Gallagher, J. Appl. Phys., 68, 4375 (1990).
42. G. Turban, Y. Catherine, and B. Grolleau, Plasma Chem. Plasma Proc., 2, 61 (1982).
43. D. Mataras, D. Rapakoulias, and S. Cavadias, in Proceedings of 8th International Symposium on Plasma Chemistry, Vol. 3, K. Akashi and A. Kinbara, Editors, p. 1484, Tokyo (1987).