Control of surface reactions in high-performance SiO2 etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 4, 2000, Pages 1897-1902

  Tatsumi, T ^a   Matsui, M ^a   Okigawa, M ^a   Sekine, M ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 26444522599     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (22)

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