Design issues in ionized metal physical vapor deposition of copper

Journal of Applied Physics

Volumn 83, Issue 1, 1998, Pages 35-43

  Grapperhaus, Michael J ^a,c   Krivokapic, Zoran ^b   Kushner, Mark J ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b ADVANCED MICRO DEVICES   (United States)

^c Materials Research Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002915776     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366698     Document Type: Article

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