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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2004-2010

Fluorocarbon radicals and surface reactions in fluorocarbon high density etching plasma. I. O2 addition to electron cyclotron resonance plasma employing CHF3

(3) Takahashi, Kunimasa a Hori, Masaru a Goto, Toshio a

a NAGOYA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030516057 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.580075 Document Type: Article

Times cited : (50)

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