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Volumn , Issue , 2002, Pages 7-20

A new reliability model for post-cycling charge retention of Flash memories

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; ELECTRIC CHARGE; ELECTRIC POTENTIAL; LEAKAGE CURRENTS; RELIABILITY;

EID: 0036089046     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (91)

References (51)
  • 26
    • 0033332338 scopus 로고    scopus 로고
    • A high density high performance 180nm generation ETOX™ Flash memory technology
    • (1999) Proc. IEDM , pp. 267-270
    • Fazio, A.1
  • 27
  • 37
    • 0034979786 scopus 로고    scopus 로고
    • Physical and predictive models of ultra thin oxide reliability in CMOS devices and circuits
    • (2001) Proc. IRPS , pp. 132-149
    • Stathis, J.1
  • 40
    • 0001199440 scopus 로고
    • Trapping and trap creation studies on nitrided and reoxidized-nitrided silicon dioxide films on silicon
    • 1
    • (1991) J. Appl. Phys. , vol.70 , Issue.3 , pp. 1500-1509
    • DiMaria, J.1    Stathis, J.H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.