Modification of plasma-etched profiles by sputtering

IEEE Transactions on Plasma Science

Volumn 27, Issue 3, 1999, Pages 668-675

  Abraham Shrauner, Barbara ^a,c   Jagannathan, Nina ^b  

^a WASHINGTON UNIVERSITY IN ST LOUIS   (United States)

^b Department of Electrical Engineering ^*  (United States)

^c Supervisory Control and Data Acquisition Group   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; ION BOMBARDMENT; SPUTTERING;

ION BEAM ETCHING; PLASMA SPUTTERING;

PLASMA ETCHING;

EID: 0032624912     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.774670     Document Type: Article

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