The effect of mask erosion on process latitudes in bi-layer lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1262, Issue , 1990, Pages 94-109

  Jurgensen, Charles W ^a   Novembre, Anthony E ^a   Shaqfeh, Eric S G ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANGULAR DISTRIBUTION; EROSION; KINETIC THEORY; LITHOGRAPHY; PLASMA SHEATHS; SPUTTERING;

BOMBARDMENT ENERGY; ENERGETIC PARTICLES; INCIDENT PARTICLES; INTERFACE EVOLUTION; ORGANOSILICON POLYMERS; P-CHLOROMETHYLSTYRENE; RATE-CONTROLLING STEPS; STEADY-STATE MODELING;

ETCHING;

EID: 33749714171     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.20093     Document Type: Conference Paper

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