Electron and ion distribution functions in RF and microwave plasmas

Plasma Sources Science and Technology

Volumn 4, Issue 2, 1995, Pages 172-182

  Kortshagen, U ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DISTRIBUTION FUNCTION; ION DISTRIBUTION FUNCTION; LOW PRESSURE PLASMAS; MICROWAVE PLASMAS; RADIOFREQUENCY PLASMAS;

APPROXIMATION THEORY; ELECTRON TRANSPORT PROPERTIES; IONS; MICROWAVES;

PLASMAS;

EID: 0029308907     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/4/2/002     Document Type: Article

References (99)

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2. Novel radio-frequency induction plasma processing techniques
3. Frequency effects in plasma etching
4. Comparison of microwave and lower frequency plasmas for thin film deposition and etching
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7. Main Features of the Electron Kinetics in Collision Dominated Steady-State rf Plasmas
8. Electron Kinetics of Weakly Ionized HF Plasmas. II. Decoupling in the Fourier Hierarchy and Simplified Kinetics at Higher Frequencies
9. A collisional-radiative model for microwave discharges in helium at low and intermediate pressures
10. Electron energy distribution functions in radio-frequency collision dominated nitrogen discharges
11. Der Einfluß einer Blende auf die Verteilungsfunktion der Elektronen in einem Gasentladungsplasma. II Die Messung der Verteilungsfunktion der Elektronen in der Umgebung einer Blende
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17. Dynamics of a collisional, capacitive RF sheath