|
Volumn 55, Issue 19, 1989, Pages 1960-1962
|
Universal energy dependence of physical and ion-enhanced chemical etch yields at low ion energy
|
Author keywords
[No Author keywords available]
|
Indexed keywords
|
EID: 0001442869
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.102336 Document Type: Article |
Times cited : (267)
|
References (28)
|