INVESTIGATION OF PLASMA ETCHING MECHANISMS USING BEAMS OF REACTIVE GAS IONS.

Journal of vacuum science & technology

Volumn 18, Issue 2, 1980, Pages 349-352

  Mayer, T M ^a   Barker, R A ^a   Whitman, L J ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; ION BEAMS; PLASMAS;

ETCHING;

EID: 0018986235     PISSN: 00225355     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.570780     Document Type: Conference Paper

References (27)