Simulation of surface topography evolution during plasma etching by the method of characteristics

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 12, Issue 3, 1994, Pages 620-635

  Dalvie, Manoj ^b   Hamaguchi, Satoshi ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONVENTIONAL METHODS; ETCHING BEHAVIOR; EVOLUTION ALGORITHMS; INTEGRATION TIME; JUMP CONDITIONS; METHOD OF CHARACTERISTICS; SLOPE DISCONTINUITIES; SURFACE SLOPE;

EVOLUTIONARY ALGORITHMS;

PLASMA ETCHING;

EID: 21344483042     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.578846     Document Type: Article

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