Polysiloxanes with a phenol moiety for bilayer photoresist applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1086, Issue , 1989, Pages 162-172

  Onishi, Yasunobu ^a   Ushirogouchi, Touru ^a   Horiguchi, Runiko ^a   Hayase, Shuzi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; EXCIMER LASERS; OXYGEN; PHENOLS; PHOTORESISTS; RESINS;

BILAYER PHOTORESISTS; BILAYER RESISTS; DIAZO COMPOUNDS; KRF EXCIMER LASER; LINE-AND-SPACE PATTERNS; PENDANT GROUPS; POSITIVE RESISTS; TETRAMETHYL AMMONIUM HYDROXIDE;

SILICONES;

EID: 85075138491     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.953028     Document Type: Conference Paper

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