SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Applied Physics Letters

Volumn 50, Issue 21, 1987, Pages 1506-1508

Near threshold sputtering of Si and SiO2 in a Cl2 environment

(5) Oostra, D J a Van Ingen, R P a Haring, A a De Vries, A E a Van Veen, G N A b

a FOM INSTITUTE AMOLF (Netherlands)

b PHILIPS RESEARCH LABORATORIES (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001153540 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.97814 Document Type: Article

Times cited : (56)

References (27)

1
- 0018469799
- (1979) J. Appl. Phys , vol.50 , pp. 3189
- Coburn, J.W.¹ Winters, H.F.²

2
- 0018441483
- (1979) J. Vac. Sci. Technol , vol.16 , pp. 391
- Coburn, J.W.¹ Winters, H.F.²

3
- 0000016547
- (1981) Phys. Rev. B , vol.23 , pp. 823
- Tu, Y.¹ Chuang, T.J.² Winters, H.F.³

4
- 0000307870
- (1981) Surf. Sci , vol.103 , pp. 177
- Gerlach Meyer, U.¹ Coburn, J.W.² Kay, E.³

5
- 0011749704
- (1982) Appl. Phys. Lett , vol.41 , pp. 174
- Haring, R.A.¹ Haring, A.² Saris, F.W.³ de Vries, A.E.⁴

6
- 0022025679
- (1985) Nucl. Instrum. Methods B , vol.7-8 , pp. 825
- Mizutani, T.¹ Dale, C.J.² Chu, W.K.³ Mayer, T.M.⁴

7
- 0021427430
- (1984) J. Appl. Phys , vol.55 , pp. 3813
- Kolfschoten, A.W.¹ Haring, R.A.² Haring, A.³ de Vries, A.E.⁴

8
- 0022664286
- (1987) Nucl. Instrum. Methods B , vol.18 , pp. 625
- Zalm, P.C.¹ Kolfschoten, A.W.² Sanders, F.H.M.³ Vischer, P.⁴

9
- 84953683209
- (1984) J. Vac. Sci. Technol. A , vol.2 , pp. 487
- Sanders, F.H.M.¹ Kolfschoten, A.W.² Dieleman, J.³ Haring, R.A.⁴ Haring, A.⁵ de Vries, A.E.⁶

10
- 0042404834
- (1985) J. Vac. Sci. Technol. B , vol.3 , pp. 1384
- Dieleman, J.¹ Sanders, F.H.M.² Kolfschoten, A.W.³ Zalm, P.C.⁴ de Vries, A.E.⁵ Haring, A.⁶

11
- 84913868517
- (1984) J. Vac. Sci. Technol. A , vol.2 , pp. 492
- Vitkavage, D.J.¹ Ameen, M.S.² Mayer, T.M.³

12
- 0022011904
- (1985) J. Appl. Phys , vol.57 , pp. 1336
- Barish, E.L.¹ Vitkavage, D.J.² Mayer, T.M.³

13
- 0020497860
- (1983) J. Vac. Sci. Technol. B , vol.1 , pp. 37
- Barker, R.A.¹ Mayer, T.M.² Pearson, W.C.³

14
- 0042782289
- (1985) J. Vac. Sci. Technol. B , vol.3 , pp. 485
- McNevin, S.C.¹ Becker, G.E.²

15
- 4243152469
- (1986) J. Vac. Sci. Technol. A , vol.4 , pp. 696
- Gillis, H.P.¹ Gignac, W.J.²

16
- 0000581517
- (1985) J. Vac. Sci. Technol. B , vol.3 , pp. 1376
- Winters, H.F.¹ Coburn, J.W.²

17
- 0020594814
- (1983) J. Vac. Sci. Technol. B , vol.1 , pp. 23
- Flamm, D.L.¹ Donnelly, V.M.² Ibbotson, D.E.³

18
- 0015483966
- (1972) J. Appl. Phys , vol.43 , pp. 4965
- Coburn, J.W.¹ Kay, E.²

19
- 0020089108
- (1982) J. Electrochem. Soc , vol.129 , pp. 393
- Bruce, R.H.¹ Reinberg, A.R.²

20
- 36549100807
- (1985) J. Appl. Phys , vol.57 , pp. 59
- Köhler, K.¹ Coburn, J.W.² Horne, D.E.³ Kay, E.⁴

21
- 36549102085
- (1985) J. Appl. Phys , vol.58 , pp. 3350
- Köhler, K.¹ Horne, D.E.² Coburn, J.W.³

22
- 36549100753
- (1986) J. Appl. Phys , vol.59 , pp. 1890
- Thompson, B.E.¹ Allen, K.D.² Richards, A.D.³ Sawin, H.H.⁴

23
- 3843104602
- edited by J. W. Coburn, R. A. Gottscho, and D. W. Hess (Materials Research Society, Pittsburgh, PA)
- (1986) Proceedings of the Symposium on Plasma Processing at the MRS meeting, Palo Alto, 1986 , pp. 109-114
- Briaud, P.¹ Turban, G.² Grolleau, B.³

24
- 84950580871
- Proceedings of the Meeting of The Electrochemical Society, San Diego,(to be published).
- (1986)
- Coburn, J.W.¹ Köhler, K.²

25
- 0019016751
- (1980) J. Vac. Sci. Technol , vol.17 , pp. 721
- Mogab, C.J.¹ Levinstein, H.J.²

26
- 0020176105
- (1982) J. Vac. Sci. Technol , vol.21 , pp. 725
- Kaufman, H.R.¹ Cuomo, J.J.² Harper, J.M.E.³

27
- 3643090763
- (1969) Phys. Rev , vol.184 , pp. 383
- Sigmund, P.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.