Simulation of reactive ion etching pattern transfer

Journal of Applied Physics

Volumn 66, Issue 10, 1989, Pages 4664-4675

  Shaqfeh, Eric S G ^a   Jurgensen, Charles W ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36549097874     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.343823     Document Type: Article

References (0)