Energy Dispersion of Positive Ions Effused from an RF Plasma

Journal of the Physical Society of Japan

Volumn 29, Issue 1, 1970, Pages 187-191

  Okamoto, Yukio ^a   Tamagawa, Hajime ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001026457     PISSN: 00319015     EISSN: 13474073     Source Type: Journal    
DOI: 10.1143/JPSJ.29.187     Document Type: Article

References (12)

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6. T. Tsuchimoto: Japan. J. appl. Phys. 5 (1966) 327.
7. J. F. Williams: Rev. sci. Instrum. 37 (1966) 1207.
8. Y. Okamoto and H. Tamagawa: J. Phys. Soc. Japan 27 (1969) 270.
9. Y. Okamoto and H. Tamagawa: J. Phys. Soc. Japan 28 (1970) 269.
10. G. Pierce: Focusing of Charged Particles (1967) Vol. 2.
11. H. Niedermeyer: Institut für plasma Physik München IPP 1/66 (1967).
12. W. Paul, H. P. Reinhard and V. von Zahn: Z. Phys. (Germany) 152 (1958) 143.