Low Temperature Thermal Atomic Layer Deposition of Cobalt Metal Films

Chemistry of Materials

Volumn 28, Issue 3, 2016, Pages 700-703

  Klesko, Joseph P ^a   Kerrigan, Marissa M ^a   Winter, Charles H ^a  

^a WAYNE STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; COBALT METALLOGRAPHY; METALLIC FILMS; RUTHENIUM; SUBSTRATES; TEMPERATURE; THICK FILMS;

COBALT PRECURSORS; CONTINUOUS FILMS; GROWTH BEHAVIOR; GROWTH STUDIES; LOW TEMPERATURES; NUMBER OF CYCLES; PLATINUM SUBSTRATES; SUBSTRATE TEMPERATURE;

ATOMIC LAYER DEPOSITION;

EID: 84957964166     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/acs.chemmater.5b03504     Document Type: Article

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