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Volumn 16, Issue 4, 2009, Pages 219-225

Area selective atomic layer deposition of cobalt thin films

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ATOMS; COBALT; THIN FILMS;

EID: 63149085032     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2979997     Document Type: Conference Paper
Times cited : (39)

References (14)
  • 1
    • 63149086009 scopus 로고    scopus 로고
    • S. Wolf, Silicon processing for the VLSI era. 4, Deep-submicron process technology, p. 618, Lattice Press, California (2002).
    • S. Wolf, Silicon processing for the VLSI era. Vol. 4, Deep-submicron process technology, p. 618, Lattice Press, California (2002).
  • 10
    • 35548989676 scopus 로고    scopus 로고
    • X. Jiang and S. F. Bent, J. Electrochem. Soc., 154, D648 (2007).
    • X. Jiang and S. F. Bent, J. Electrochem. Soc., 154, D648 (2007).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.