Metal-organic chemical vapour deposition of thin films of cobalt on different substrates: Study of microstructure

Thin Solid Films

Volumn 413, Issue 1-2, 2002, Pages 8-15

  Paranjape, Mandar A ^a   Mane, Anil U ^a   Raychaudhuri, A K ^a   Shalini, K ^a   Shivashankar, S A ^a   Chakravarty, B R ^b  

^a INDIAN INSTITUTE OF SCIENCE   (India)

^b NATIONAL PHYSICAL LABORATORY   (India)

Author keywords

Cobalt; Metal organic chemical vapour deposition (MOCVD); Secondary ion mass spectrometry (SIMS); Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; COBALT; DIFFUSION; ELECTRIC CONDUCTIVITY; FILM GROWTH; GLASS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; OXYGEN; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

FILM MICROSTRUCTURE;

MAGNETIC THIN FILMS;

EID: 0037166535     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00446-7     Document Type: Article

References (13)