Structural characterization of cobalt thin films grown by metal-organic CVD

Chemical Vapor Deposition

Volumn 11, Issue 5, 2005, Pages 235-243

  Chioncel, Mariana F ^b   Haycock, Peter W ^a  

^a KEELE UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF BUCHAREST   (Romania)

Author keywords

Cobalt thin films; Crystalline structure; MOCVD; Surface morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; COBALT; COMPRESSIVE STRESS; CRYSTAL STRUCTURE; FILM GROWTH; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SURFACES; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION;

COBALT THIN FILMS; CRYSTALLINE STRUCTURE; FIELD-EMISSION SCANNING ELECTRON MICROSCOPY (FESEM); PRECURSORS;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 20544460685     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200406341     Document Type: Article

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