Thermal Atomic Layer Deposition of Titanium Films Using Titanium Tetrachloride and 2-Methyl-1,4-bis(trimethylsilyl)-2,5-cyclohexadiene or 1,4-Bis(trimethylsilyl)-1,4-dihydropyrazine

Chemistry of Materials

Volumn 27, Issue 14, 2015, Pages 4918-4921

  Klesko, Joseph P ^a   Thrush, Christopher M ^b   Winter, Charles H ^a  

^a WAYNE STATE UNIVERSITY   (United States)

^b Wayne State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; METAL IONS; METALS; OXIDE FILMS; TITANIUM OXIDES;

CHEMICAL PRECURSORS; CONFORMAL COATINGS; GROWTH TECHNIQUES; LAYER-BY-LAYER GROWTH; PRECURSOR METALS; SELF-LIMITING GROWTHS; TITANIUM METALS; TITANIUM TETRACHLORIDES;

ATOMIC LAYER DEPOSITION;

EID: 84937867780     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/acs.chemmater.5b01707     Document Type: Article

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