Directed self-assembly of block copolymers by chemical or topographical guiding patterns: Optimizing molecular architecture, thin-film properties, and kinetics

Progress in Polymer Science

Volumn 54-55, Issue , 2016, Pages 47-75

  Li, Weihua ^a,b   Müller, Marcus ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b FUDAN UNIVERSITY   (China)

Author keywords

Block copolymer; Chemoepitaxy; Directed self assembly (DSA); Graphoepitaxy; Thin film

Indexed keywords

KINETICS; LITHOGRAPHY; PHASE SEPARATION; SELF ASSEMBLY; THIN FILMS;

CHEMOEPITAXY; DIRECTED SELF-ASSEMBLY; GRAPHOEPITAXY; KINETICS OF STRUCTURE FORMATION; MOLECULAR ARCHITECTURE; NEXT GENERATION LITHOGRAPHY; PATTERNING TECHNIQUES; PHASE SEPARATION KINETICS;

BLOCK COPOLYMERS;

EID: 84947307646     PISSN: 00796700     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.progpolymsci.2015.10.008     Document Type: Review

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