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Volumn 46, Issue 19, 2013, Pages 7567-7579

Directed block copolymer thin film self-assembly: Emerging trends in nanopattern fabrication

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER THIN FILMS; DIRECTED SELF-ASSEMBLY; FILM NANOSTRUCTURES; FUTURE RESEARCH DIRECTIONS; IN-SITU CHARACTERIZATION; NANOPOROUS MEMBRANE; NANOSCALE STRUCTURE; PROCESSING APPROACH;

EID: 84885206319     PISSN: 00249297     EISSN: 15205835     Source Type: Journal    
DOI: 10.1021/ma401112y     Document Type: Review
Times cited : (242)

References (169)
  • 11
    • 84885220544 scopus 로고    scopus 로고
    • HGST Reaches 10-Nanometer Patterned-bit Milestone, Nanotechnology Process Will Double Today's Disk Drive Data Density; HGST Press Release February 28
    • HGST Reaches 10-Nanometer Patterned-bit Milestone, Nanotechnology Process Will Double Today's Disk Drive Data Density; HGST Press Release February 28, 2013.
    • (2013)
  • 32
    • 84885199451 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors
    • International Technology Roadmap for Semiconductors, 2012; http://www.itrs.net.
    • (2012)
  • 37
    • 84885215526 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors
    • International Technology Roadmap for Semiconductors, 2007; http://www.itrs.net.
    • (2007)
  • 90
  • 123
    • 84874858254 scopus 로고    scopus 로고
    • Controlled Multiscale Dewetting of Self Organized Block Copolymers
    • Ariga, K. The Royal Society of Chemistry: London
    • Huh, J.; Park, C. Controlled Multiscale Dewetting of Self Organized Block Copolymers. In Manipulation of Nanoscale Materials: An Introduction to Nanoarchitectonics; Ariga, K., Ed.; The Royal Society of Chemistry: London, 2012; pp 28-86.
    • (2012) Manipulation of Nanoscale Materials: An Introduction to Nanoarchitectonics , pp. 28-86
    • Huh, J.1    Park, C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.