Simulation of defect reduction in block copolymer thin films by solvent annealing

ACS Macro Letters

Volumn 4, Issue 1, 2015, Pages 11-15

  Hur, Su Mi ^a,b   Khaira, Gurdaman S ^a   Ramírez Hernández, Abelardo ^a,b   Müller, Marcus ^c   Nealey, Paul F ^a,b   De Pablo, Juan J ^a,b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CHICAGO   (United States)

^c UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84921364731     PISSN: None     EISSN: 21611653     Source Type: Journal    
DOI: 10.1021/mz500705q     Document Type: Article

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