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Volumn 43, Issue 19, 2010, Pages 8290-8295

Enhancing the potential of block copolymer lithography with polymer self-consistent field theory simulations

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER LITHOGRAPHY; GRAPHOEPITAXY; HEXAGONAL LATTICE; SELF CONSISTENT FIELD THEORY; TEMPLATED; THREE DIMENSIONS;

EID: 77957800911     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma101360f     Document Type: Article
Times cited : (38)

References (36)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.