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Volumn 47, Issue 1, 2014, Pages 2-12

Block copolymer lithography

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER LITHOGRAPHY; FILM RESEARCH; LITHOGRAPHIC RESOLUTION; OPTIMAL MATERIALS; THERMAL-ANNEALING; TOPDOWN;

EID: 84892597058     PISSN: 00249297     EISSN: 15205835     Source Type: Journal    
DOI: 10.1021/ma401762n     Document Type: Review
Times cited : (567)

References (121)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.