Aligned sub-10-nm block copolymer patterns templated by post arrays

ACS Nano

Volumn 6, Issue 3, 2012, Pages 2071-2077

  Chang, Jae Byum ^a   Son, Jeong Gon ^a   Hannon, Adam F ^a   Alexander Katz, Alfredo ^a   Ross, Caroline A ^a   Berggren, Karl K ^b  

^a USA   (United States)

^b Department of Electrical Engineering and Computer Science   (United States)

Author keywords

block copolymer; high throughput; line pattern; nanolithography; self assembly; templated self assembly

Indexed keywords

BLOCK COPOLYMER FILMS; CONTROLLED ORIENTATION; HIGH THROUGHPUT; IN-PLANE ORIENTATION; LINE PATTERN; LONG RANGE ORDERS; NANO PATTERN; NARROW LINES; SELF CONSISTENT FIELD THEORY; TEMPLATED;

MEAN FIELD THEORY; MOLECULAR ORBITALS; NANOLITHOGRAPHY; SELF ASSEMBLY; STYRENE; THREE DIMENSIONAL;

BLOCK COPOLYMERS;

EID: 84859142135     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn203767s     Document Type: Article

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