SCOPUS 정보 검색 플랫폼

Chemical Vapor Deposition

Volumn 20, Issue 4-6, 2014, Pages 118-124

Characterization of al2o3 thin films fabricated at low temperature via atomic layer deposition on pen substrates

(4) Choi, Kyung Hyun a Ali, Kamran a Kim, Chang Young a Muhammad, Nauman Malik b

a Jeju National University (South Korea)

b YILDIRIM BEYAZIT UNIVERSITY (Turkey)

Author keywords

ALD; Film properties; Low temperature; PEN; XPS

Indexed keywords

ALUMINUM; CARBON FILMS; DEPOSITION; FILM GROWTH; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALD; CARBON CONTAMINATION; FILM PROPERTIES; INSULATING PROPERTIES; LOW TEMPERATURES; PEN; POLYETHYLENE NAPHTHALATE; TRIMETHYLALUMINUM;

ATOMIC LAYER DEPOSITION;

EID: 84902243898 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.201307082 Document Type: Article

Times cited : (10)

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