Electrical properties of Al2O3 film deposited at low temperatures

Journal of Non-Crystalline Solids

Volumn 303, Issue 1, 2002, Pages 78-82

  Ha, W H ^a   Choo, M H ^a   Im, S ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CAPACITANCE; CURRENT VOLTAGE CHARACTERISTICS; DIELECTRIC FILMS; ELECTRIC BREAKDOWN; LEAKAGE CURRENTS; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; ROUGHNESS MEASUREMENT; SURFACE ROUGHNESS; THIN FILM TRANSISTORS;

CAPACITANCE-VOLTAGE MEASUREMENT;

AMORPHOUS FILMS;

EID: 0036567764     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(02)00968-7     Document Type: Article

References (11)