Kinetics and characterization of plasma grown aluminium oxide

Journal of Applied Physics

Volumn 83, Issue 10, 1998, Pages 5570-5572

  Four, S ^a   Devine, R A B ^a   Vallier, L ^a,b  

^a ORANGE LABS   (France)

^b INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001377692     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367393     Document Type: Article

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