Effects of ozone as an oxygen source on the properties of the Al2O3 thin films prepared by atomic layer deposition

Materials Chemistry and Physics

Volumn 78, Issue 3, 2003, Pages 733-738

  Kim, Jaebum ^a   Chakrabarti, Kuntal ^a   Lee, Jinho ^b   Oh, Ki Young ^c   Lee, Chongmu ^a  

^a Inha University   (South Korea)

^b Yonsei University   (South Korea)

^c Jusung Engineering Company Limited   (South Korea)

Author keywords

Al2O3; Atomic layer deposition; Auger; Growth rate; Ozone (O3); RBS; XPS

Indexed keywords

DEPOSITION; FILM GROWTH; OZONE; POLYSILICON; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION (ALD);

ALUMINA;

EID: 0037469516     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(02)00375-9     Document Type: Article

References (22)

1. Aboaf J.A. J. Electrochem. Soc. 114:1967;948.
2. Abbott R.A., Kamins T.I. Solid State Technol. 24:1981;182.
3. Zaininger K.H., Waxman A.S. IEEE Trans. Electron Device. 16:1969;333.
4. E. Dorre, H. Hubner, Alumina, Springer, Berlin, 1984.
5. Yang W.S., Kim Y.K., Yang S.-Y., Choi J.H., Park H.S., Lee S.I., Yoo J.-B. Surf. Coat. Technol. 131:2000;79.
6. Dossantos W.N., Paulin P.I., Taylor R. J. Eur. Ceram. Soc. 18(7):1998;807.
7. Ishida M., Sawada K., Yamaguchi S., Nakamura T., Suzaki T. Appl. Phys. Lett. 55:1989;56.
8. Fredriksson E., Carlson J.O. J. Chem. Vapor Dep. 1:1993;333.
9. Kang C.J., Chun J.S., Lee W.J. Thin Solid Films. 189:1990;161.
10. Ritala M., Saloniemi H., Leskela M., Prohaska T., Friedbacher G., Grasserbauer M. Thin Solid Films. 286:1996;54.
11. Kim Y., Lee S.M., Park C.S., Lee S.I., Lee M.Y. Appl. Phys. Lett. 71:1997;3604.
12. Matero R., Rahtu A., Ritala M., Leskela M., Sajavaara T. Thin Solid Films. 368:2000;1.
13. Suritola T. Thin Solid Films. 216:1992;84.
14. Leskela M., Ritala M. J. Phys. IV. 5:1995;C5-937.
15. Ritala M., Leskela M., Rauhala E., Jokinen J. J. Electrochem. Soc. 145(8):1998;2914.
16. J. Shepard, C. D'Emic, P. Kozlowski, A. Chakrabarti, R. Jammy, in: Proceedings of the ALD Conference, Moterey, California, USA, May 14th, 2001.
17. Higashi G.S., Fleming C.G. Appl. Phys. Lett. 55:1989;1963.
18. Ferguson J.D., Weimer A.W., George S.M. Thin Solid Films. 371:2000;95.
19. Ott A.W., Klaus J.W., Johnson J.M., George S.M. Thin Solid Films. 292:1997;135.
20. Jusung Engineering Co. Ltd., in house R&D data (unpublished).
21. Jung Y.C., Miura H., Ohtani K., Ishida M. J. Crust. Growth. 196:1999;88.
22. Yang W.S., Kim Y.K., Yang S.Y., Choi J.H., Park H.S., Lee S.I., Yoo J.B. Surf. Coat. Technol. 131:2000;79.