The kinetics of low-temperature spatial atomic layer deposition of aluminum oxide

Thin Solid Films

Volumn 532, Issue , 2013, Pages 22-25

  Poodt, P ^a   Illiberi, A ^a   Roozeboom, F ^a,b  

^a TNO   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Aluminum oxide; Low temperature; Spatial atomic layer deposition

Indexed keywords

ALUMINUM OXIDES; CRITICAL PARAMETER; HIGH-THROUGHPUT; LOW TEMPERATURES; LOW-TEMPERATURE DEPOSITION; MANUFACTURING TECHNIQUES; THIN-FILM DEPOSITIONS; WATER PARTIAL PRESSURE;

ALUMINA; ATOMIC LAYER DEPOSITION; TEMPERATURE;

DEPOSITION;

EID: 84875227109     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.10.109     Document Type: Article

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