Photopolymer materials and processes for advanced technologies

Chemistry of Materials

Volumn 26, Issue 1, 2014, Pages 533-548

  Crivello, James V ^a   Reichmanis, Elsa ^b,c  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b Georgia Institute of Technology   (United States)

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

imaging; photoacid generator; photopolymer; photopolymerization; photoresist

Indexed keywords

ADVANCED TECHNOLOGY; PHOTOACID GENERATORS; PHOTOPOLYMER MATERIAL; PHOTOSENSITIVE MOLECULES; PROPERTY CHANGES;

CHROMOPHORES; IMAGING TECHNIQUES; LIGHT SENSITIVE MATERIALS; MECHANICAL PROPERTIES; PHOTOCHEMICAL REACTIONS; PHOTOPOLYMERIZATION; PHOTORESISTS; PHOTOSENSITIVITY;

PHOTOPOLYMERS;

EID: 84892585985     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm402262g     Document Type: Review

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