Vinyl ether resist system for UV-cured nanoimprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Ito, Hiroshi ^a   Houle, Frances A ^a   Hart, Mark W ^a   DiPietro, Rick A ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Cationic polymerization; Crosslinking; Curing; Photo DSC; Photochemical acid generator; Resist; Sensitizer; Stabilizer; Step and flash nanoimprint lithography; Vinyl ether

Indexed keywords

CATIONIC POLYMERIZATION; CROSSLINKING; CURING; METHANOL; PHOTOLITHOGRAPHY; PHOTORESISTS; SOLUBILITY; VINYL RESINS;

NANOIMPRINT LITHOGRAPHY; PHENOTHIAZINE; PHOTO DSC; PHOTOCHEMICAL ACID GENERATORS; RESIST; SENSITIZER; STABILIZER; STEP-AND-FLASH NANOIMPRINT LITHOGRAPHY; VINYL ETHER;

NANOSTRUCTURED MATERIALS;

EID: 33745600419     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656518     Document Type: Conference Paper

References (12)

1. C. G. Willson and M. E. Colburn, US Patent 6,334,960 (01/01/2002), US Patent 6,719,915 (04/13/2004).
2. D. J. Resnik, W. J. Dauksher, D. Mancini, K. J. Nordquist, T. C. Bailey, S. Johnson, N. Stacey, J. G. Ekerdt, C. G. Willson, S. V. Sreenivasan, and N. Schumaker, Proc. SPIE, 5037, 12, 2003.
3. E. K. Kim, N. A. Stacey, B. J. Smith, M. D. Dickey, S. C. Johnson, B. C. Trinque, and C. G. Willson, J. Vac. Sci. Technol., B22(1), 131, 2004.
4. E. K. Kim, M. D. Stewart, K. Wu, F. L Palmieri, M. D. Dickey, J. G. Ekerdt, and C. G. Willson, J. Vac. Sci. Technol., B23(6), 2967, 2005.
5. W. H. Watanabe and L. E. Conlon, J. Amer. Chem. Soc., 79, 2828, 1957.
6. W. M. Lamanna, C. R. Kessel, P. M. Savu, Y. Cheburkov, S. Brinduse, T. A. Kestner, G. J. Lillquist, M. J. Parent, K. S. Moorhouse, Y. Zhang, G. Birznieks, T. Kruger, and M. C. Pallazzotto, Proc. SPIE, 4690, 817, 2002.
7. T. Asakura, H. Yamato, T. Hintermann, and M. Ohwa, Proc. SPIE, 5753, 140, 2005.
8. H. Ito and C. G. Willson, in ACS Symposium Series 242, "Polymers in Electronics," T. Davidson, ed., American Chemical Society, Washington, D. C., 11, 1984.
9. N. Sakai, J. Taniguchi, K. Kawaguchi, M. Ohtaguchi, and T. Hirasawa, J. Photopolym. Sci. Technol., 18, 531, 2005.
10. J. V. Crivello, in UV Curing: Science and Technology, S. P. Pappas, ed., Technology Marketing Corporation, Stamford, CT, 23, 1978.
11. E. K. Kim, J. G. Ekerdt, and C. G. Willson, J. Vac. Sci. Technol., B23(4), 1515, 2005.
12. R. D. Allen, G. M. Wallraff, and W. D. Hinsberg, J. Vac. Sci. Technol., B9(6), 3357, 1991.