Identifying materials limits of chemically amplified photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Wu, Wen Li ^a   Prabhu, Vivek M ^a   Lin, Eric K ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICALLY AMPLIFIED PHOTORESISTS; LINE EDGE ROUGHNESS (LER); NANOMETER RESOLUTION; NEUTRON REFLECTIVITY; PHOTOACIDS;

INFRARED SPECTROSCOPY; NEUTRON REFLECTION; OPTICAL MATERIALS; OPTICAL RESOLVING POWER; SEMICONDUCTOR DEVICE MANUFACTURE;

PHOTORESISTS;

EID: 35048851569     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.720424     Document Type: Conference Paper

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