Thin film buckling as a method to explore the effect of reactive rinse treatments on the mechanical properties of resist thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Yeh, Wei Ming ^a   Noga, David E ^a   Lawson, Richard A ^a   Tolbert, Laren M ^b   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Pattern collapse; Reactive rinse; Thin film buckling

Indexed keywords

32-NM NODE; BULK COUNTERPART; CARBODIIMIDE CHEMISTRY; CROSS LINKING AGENTS; DICARBOXYLIC ACID; INTEGRATED CIRCUIT FABRICATION; LITHOGRAPHIC PATTERNING; NANO SCALE; PATTERN COLLAPSE; PDMS SUBSTRATE; POLYMER THIN FILMS; POTENTIAL METHODS; REACTIVE RINSE; THERMAL PROPERTIES;

BUCKLING; CROSSLINKING; FILM THICKNESS; FUNCTIONAL GROUPS; MECHANICAL PROPERTIES; NANOSTRUCTURED MATERIALS; OXIDE MINERALS; PLASTIC FILMS; POLYMERIC FILMS; POLYMERS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; THERMODYNAMIC PROPERTIES; ULTRATHIN FILMS; VAPOR DEPOSITION;

POLYMER FILMS;

EID: 77953505574     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.862009     Document Type: Conference Paper

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