Direct measurement of the reaction front in chemically amplified photoresists

Science

Volumn 297, Issue 5580, 2002, Pages 372-375

  Lin, Eric K ^a   Soles, Christopher L ^a   Goldfarb, Dario L ^a   Trinque, Brian C ^a   Burns, Sean D ^a   Jones, Ronald L ^a   Lenhart, Joseph L ^a   Angelopoulos, Marie ^a   Willson, C Grant ^a   Satija, Sushil K ^a   Wu, Wen Li ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; NEUTRON SCATTERING; PROCESS CONTROL; REFLECTOMETERS; SEMICONDUCTOR DEVICE MANUFACTURE; X RAY ANALYSIS;

X RAY REFLECTOMETRY;

PHOTORESISTS;

NANOPARTICLE;

SEMICONDUCTOR INDUSTRY;

ARTICLE; CERAMIC INDUSTRY; CHEMICAL ANALYSIS; CHEMICAL COMPOSITION; CHEMICAL REACTION; CORRELATION ANALYSIS; DENSITY; DIFFUSION; FILM; MEASUREMENT; NEUTRON; OPTICAL RESOLUTION; PHOTOLITHOGRAPHY; PHYSICAL PHENOMENA; PRIORITY JOURNAL; REACTION ANALYSIS; REFLECTOMETRY; SEMICONDUCTOR; STRUCTURE ACTIVITY RELATION; TECHNOLOGY; X RAY ANALYSIS;

EID: 18444394633     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.1072092     Document Type: Article

References (37)