Trends in patterning materials for advanced lithography

Journal of Photopolymer Science and Technology

Volumn 20, Issue 3, 2007, Pages 453-455

  Allen, Robert D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

193nm photoresists; Immersion lithography; Imprint lithography

Indexed keywords

EID: 36148936833     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.453     Document Type: Review

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