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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 1037-1047

Understanding molecular level effects during post exposure processing

(6) Schmid, Gerard M a Smith, Mark D b Mack, Chris A b Singh, Vivek K c Burns, Sean D a Willson, Grant a

a The University of Texas at Austin (United States)

b KLA Tencor Austin (United States)

c INTEL CORPORATION (United States)

Author keywords

Line edge roughness; Mesoscale simulation; PROLITH; Surface roughness

Indexed keywords

COMPUTER SIMULATION; DISSOLUTION; MOLECULES; OLIGOMERS; SURFACE ROUGHNESS;

MESOSCALE SIMULATIONS;

PHOTORESISTS;

EID: 0034768090 PISSN: 0277786X EISSN: None Source Type: Journal
DOI: 10.1117/12.436829 Document Type: Article

Times cited : (39)

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