Advanced electron beam resist requirements and challenges

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8682, Issue , 2013, Pages

  Jamieson, Andrew ^a   Olson, Bennett ^a   Lu, Maiying ^a   Wilcox, Nathan ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Electron beam lithography; LER; Photomask; Requirements; Resists; Resolution; Sensitivity

Indexed keywords

BACKSCATTERED ELECTRONS; ELECTRON BEAM RESIST; ELECTRON-BEAM EXPOSURE; LER; REQUIREMENTS; RESISTS; SEMICONDUCTOR MANUFACTURING; SENSITIVITY;

ELECTRON BEAM LITHOGRAPHY; OPTICAL RESOLVING POWER; PHOTOMASKS; SEMICONDUCTOR DEVICE MANUFACTURE;

ELECTRON BEAMS;

EID: 84878414080     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2014527     Document Type: Conference Paper

References (8)

1. Andrew T. Jamieson, Nathan Wilcox, Wai Y. Kwok and Yong Kwan Kim, "Resist process windows in electronbeam lithography", Proc. SPIE 7823, Photomask Technology 2010 78230B.
2. Andrew Jamieson, Yong Kwan Kim, Bennett Olson, Maiying Lu, Nathan Wilcox, "Advanced electron beam resist requirements and challenges", Proc. SPIE 8166, Photomask Technology 2011 816616.
3. International Technology Roadmap for Semiconductors. http://www.itrs.net/
4. Christof Klein, Hans Loeschner, Elmar Platzgummer, "50-keV electron multibeam mask writer for the 11-nm HP node: first results of the proof-of-concept electron multibeam mask exposure tool", Journal of Micro/Nanolithography, MEMS, and MOEMS. 11(3), 031402 (Aug 07 2012)
5. Amy E. Zweber, Tom Faure, Anne McGuire, Linda K. Sundberg, Ratnam Sooriyakumaran, Martha I. Sanchez, Luisa D. Bozano, Tasuku Senna, Yuki Fujita, Yoshiyuki Negishi, Masahito Tanabe, Takahiro Kaneko, "Study and comparison of negative tone resists for fabrication of bright field masks for 14nm node", Proc. SPIE. 8522, Photomask Technology 2012 85220S (December 6, 2012)
6. Luisa D. Bozano, Ratnam Sooriyakumaran, Takayuki Nagasawa, Satoshi Watanabe, Yoshio Kawai, Shinpei Kondo, Jun Kotani, Masayuki Kagawa, Linda K. Sundberg, Martha I. Sanchez, Elizabeth M. Lofano, Charles T. Rettner, Tasuku Senna, Thomas Faure, "Conductive layer for charge dissipation during electron-beam exposures", Proc. SPIE. 8522, Photomask Technology 2012 85220O (December 6, 2012)
7. Choi, J., Bae, S. J., Kim, H. B., Kim, B. G., Cho, H. K., "Pattern placement error due to resist charging effect at 50kV e-beam writer; Mechanism and its correction"Photomask Technology, Proc. of SPIE Vol. 8166 81661Z-1 (2011)
8. Ryuji Onishi; Rikimaru Sakamoto; Noriaki Fujitani; Takafumi Endo; Bang-ching Ho, "The novel top-coat material for RLS trade-off reduction in EUVL", Proc. SPIE. 8322, Advanced Microlithography (2012).