Sub-wavelength printing using multiple overlapping masks

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 119-122

  Pau, S ^a   Nalamasu, O ^a   Cirelli, R ^a   Frackoviak, J ^a   Timko, A ^a   Watson, G P ^a   Klemens, F ^a   Timp, G ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MASKS; PHOTORESISTS; SILICA; SILICON WAFERS; SILICONE COATINGS; SUBSTRATES;

CRITICAL DIMENSION; MULTIPLE EXPOSURE TECHNIQUE; MULTIPLE OVERLAPPING MASK; SUBWAVELENGTH PRINTING;

MICROELECTRONIC PROCESSING;

EID: 0034205301     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00277-X     Document Type: Article

References (2)

1. 1. SPLAT v. 5.0 Aerial Image Software. University of California, Berkeley.
2. 2. UV6 and UVN2 are trademarks owned by Shipley Company, Marlborough, MA.