Stochastic exposure kinetics of extreme ultraviolet photoresists: Simulation study

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 10, Issue 3, 2011, Pages

  Mack, Chris A ^a   Thackeray, James W ^b   Biafore, John J ^c   Smith, Mark D ^c  

^a Lithogurucom   (United States)

^b Dow Electronic Materials   (United States)

^c KLA Tencor Austin   (United States)

Author keywords

Exposure kinetics; Extreme ultraviolet photoresist; Line edge roughness; Linewidth roughness; Stochastic modeling

Indexed keywords

CONCENTRATION (PROCESS); PHOTORESISTS; RATE CONSTANTS; ROUGHNESS MEASUREMENT; SIMULATORS; STATISTICS; STOCHASTIC SYSTEMS;

EXPOSURE KINETICS; EXTREME ULTRAVIOLET; LINE EDGE ROUGHNESS; LINEWIDTH ROUGHNESS; STOCHASTIC MODELING;

STOCHASTIC MODELS;

EID: 80055059102     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3631753     Document Type: Article

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