Fluoroalcohol materials with tailored interfacial properties for immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Sanders, Daniel P ^a   Sundberg, Linda K ^a   Sooriyakumaran, Ratnam ^a   Brock, Philip J ^a   DiPietro, Richard A ^a   Truong, Hoa D ^a   Miller, Dolores C ^a   Lawson, Margaret C ^b   Allen, Robert D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM RESEARCH   (United States)

Author keywords

Contact angle; Fiuoroalcohol; Immersion lithography; Materials; Topcoat; Topcoat free resist

Indexed keywords

FLUOROALCOHOL MATERIALS; IMMERSION LITHOGRAPHY; TOPCOAT;

CONTACT ANGLE; FLUORINE CONTAINING POLYMERS; POLYMER FILMS; POLYMERS; SOLUBILITY; WATER CONTENT;

LITHOGRAPHY;

EID: 35148872760     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712768     Document Type: Conference Paper

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