Optical lithography for nanotechnology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6327, Issue , 2006, Pages

  Flagello, Donis G ^a   Arnold, Bill ^a  

^a ASML US Inc   (United States)

Author keywords

193nm; High NA; Imaging; Immersion; Polarization

Indexed keywords

193NM; HIGH NA; IMAGE OPTIMIZATION TECHNIQUES; IMMERSION;

ABERRATIONS; LIGHT POLARIZATION; NANOTECHNOLOGY; NUMERICAL ANALYSIS; OPTICAL DEVICES; OPTICAL SYSTEMS; OPTIMIZATION;

PHOTOLITHOGRAPHY;

EID: 33751087554     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.683305     Document Type: Conference Paper

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