Evolution as applied to optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6827, Issue , 2008, Pages

  Flagello, Donis G ^a  

^a ASML US Inc   (United States)

Author keywords

193nm; DPT; EUV; High NA; Hyper NA; Immersion; Nanolithography; Polarization

Indexed keywords

DOUBLE-PATTERNING TECHNOLOGY; HYPER-NA TECHNOLOGY; WATER IMMERSION TECHNOLOGY;

LENSES; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; PHOTORESISTORS; WAVELENGTH;

PHOTOLITHOGRAPHY;

EID: 43249128307     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.778113     Document Type: Conference Paper

References (3)