-
1
-
-
0037428066
-
-
10.1126/science.1079567
-
M. Lundstrom, Science 299, 210 (2003). 10.1126/science.1079567
-
(2003)
Science
, vol.299
, pp. 210
-
-
Lundstrom, M.1
-
2
-
-
84880262935
-
-
10.1126/science.1240452
-
C. Cress and S. Datta, Science 341, 140 (2013). 10.1126/science.1240452
-
(2013)
Science
, vol.341
, pp. 140
-
-
Cress, C.1
Datta, S.2
-
3
-
-
84863039889
-
-
10.1109/IEDM.2011.6131662
-
J. J. Gu, Y. Q. Liu, Y. Q. Wu, R. Colby, R. G. Gordon, and P. D. Ye, Tech. Dig.-Int. Electron Devices Meet. 2011, 769 10.1109/IEDM.2011.6131662.
-
Tech. Dig. - Int. Electron Devices Meet.
, vol.2011
, pp. 769
-
-
Gu, J.J.1
Liu, Y.Q.2
Wu, Y.Q.3
Colby, R.4
Gordon, R.G.5
Ye, P.D.6
-
5
-
-
84874611144
-
-
10.1039/c3nr33738c
-
G. Larrieu and X.-L. Han, Nanoscale 5, 2437 (2013). 10.1039/c3nr33738c
-
(2013)
Nanoscale
, vol.5
, pp. 2437
-
-
Larrieu, G.1
Han, X.-L.2
-
6
-
-
40749151146
-
-
10.1109/LED.2007.915374
-
C. Thelander, L. E. Froberg, C. Rehnstedt, L. Samuelson, and L.-E. Wernersson, IEEE Electron Device Lett. 29, 206 (2008). 10.1109/LED.2007.915374
-
(2008)
IEEE Electron Device Lett.
, vol.29
, pp. 206
-
-
Thelander, C.1
Froberg, L.E.2
Rehnstedt, C.3
Samuelson, L.4
Wernersson, L.-E.5
-
7
-
-
32044458180
-
-
10.1002/smll.200500181
-
V. Schmidt, H. Riel, S. Senz, S. Karg, W. Riess, and U. Gösele, Small 2, 85 (2006). 10.1002/smll.200500181
-
(2006)
Small
, vol.2
, pp. 85
-
-
Schmidt, V.1
Riel, H.2
Senz, S.3
Karg, S.4
Riess, W.5
Gösele, U.6
-
8
-
-
77954215176
-
-
(IEEE, Kyoto, Japan)
-
G. Bidal, D. Fleury, G. Ghibaudo, F. Boeuf, and T. Skotnicki, in Proceedings of Silicon Nanoelectronics Workshop (SNW) (IEEE, Kyoto, Japan, 2009), pp. 5-6.
-
(2009)
Proceedings of Silicon Nanoelectronics Workshop (SNW)
, pp. 5-6
-
-
Bidal, G.1
Fleury, D.2
Ghibaudo, G.3
Boeuf, F.4
Skotnicki, T.5
-
9
-
-
46049114538
-
-
10.1109/IEDM.2006.346872
-
A. Cros, K. Romanjek, D. Fleury, S. Harrison, R. Cerutti, P. Coronel, B. Dumont, A. Pouydebasque, R. Wacquez, B. Duriez, Tech. Dig.-Int. Electron Devices Meet. 2006, 663 10.1109/IEDM.2006.346872.
-
Tech. Dig. - Int. Electron Devices Meet.
, vol.2006
, pp. 663
-
-
Cros, A.1
Romanjek, K.2
Fleury, D.3
Harrison, S.4
Cerutti, R.5
Coronel, P.6
Dumont, B.7
Pouydebasque, A.8
Wacquez, R.9
Duriez, B.10
-
10
-
-
0042674228
-
-
10.1109/LED.2003.812565
-
M. Yang, E. P. Gusev, M. Ieong, O. Gluschenkov, D. C. Boyd, K. K. Chan, P. M. Kozlowski, C. P. D'Emic, R. M. Sicina, P. C. Jamison, and A. I. Chou, IEEE Electron Device Lett. 24, 339 (2003). 10.1109/LED.2003.812565
-
(2003)
IEEE Electron Device Lett.
, vol.24
, pp. 339
-
-
Yang, M.1
Gusev, E.P.2
Ieong, M.3
Gluschenkov, O.4
Boyd, D.C.5
Chan, K.K.6
Kozlowski, P.M.7
D'Emic, C.P.8
Sicina, R.M.9
Jamison, P.C.10
Chou, A.I.11
-
11
-
-
84876146846
-
-
10.1109/IEDM.2012.6479003
-
A. Majumdar, S. Bangsaruntip, G. M. Cohen, L. M. Gignac, M. Guillorn, M. M. Frank, J. W. Sleight, and D. A. Antoniadis, Tech. Dig.-Int. Electron Devices Meet. 2012, 179 10.1109/IEDM.2012.6479003.
-
Tech. Dig. - Int. Electron Devices Meet.
, vol.2012
, pp. 179
-
-
Majumdar, A.1
Bangsaruntip, S.2
Cohen, G.M.3
Gignac, L.M.4
Guillorn, M.5
Frank, M.M.6
Sleight, J.W.7
Antoniadis, D.A.8
-
12
-
-
84880309073
-
-
10.1038/ncomms1092
-
N. Clément, K. Nishiguchi, A. Fujiwara, and D. Vuillaume, Nature Commun. 1, 92 (2010). 10.1038/ncomms1092
-
(2010)
Nature Commun.
, vol.1
, pp. 92
-
-
Clément, N.1
Nishiguchi, K.2
Fujiwara, A.3
Vuillaume, D.4
-
13
-
-
84881324829
-
-
10.1038/nnano.2013.144
-
A. A. Balandin, Nat. Nanotechnol. 8, 549 (2013). 10.1038/nnano.2013.144
-
(2013)
Nat. Nanotechnol.
, vol.8
, pp. 549
-
-
Balandin, A.A.1
-
14
-
-
84863033906
-
-
10.1109/IEDM.2011.6131627
-
W. Feng, R. Hettiarachchi, Y. Lee, S. Sato, K. Kakushima, M. Sato, K. Fukuda, M. Niwa, K. Yamabe, K. Shiraishi, H. Iwai, and K. Ohmori, Tech. Dig.-Int. Electron Devices Meet. 2011, 630 10.1109/IEDM.2011.6131627.
-
Tech. Dig. - Int. Electron Devices Meet.
, vol.2011
, pp. 630
-
-
Feng, W.1
Hettiarachchi, R.2
Lee, Y.3
Sato, S.4
Kakushima, K.5
Sato, M.6
Fukuda, K.7
Niwa, M.8
Yamabe, K.9
Shiraishi, K.10
Iwai, H.11
Ohmori, K.12
-
15
-
-
84866910581
-
-
10.1109/LED.2012.2209625
-
S.-H. Lee, C.-K. Baek, S. Park, D.-W. Kim, D. K. Sohn, J.-S. Lee, D. M. Kim, and Y.-H. Jeong, IEEE Electron Device Lett. 33, 1348 (2012). 10.1109/LED.2012.2209625
-
(2012)
IEEE Electron Device Lett.
, vol.33
, pp. 1348
-
-
Lee, S.-H.1
Baek, C.-K.2
Park, S.3
Kim, D.-W.4
Sohn, D.K.5
Lee, J.-S.6
Kim, D.M.7
Jeong, Y.-H.8
-
16
-
-
79952382469
-
-
10.1063/1.3557505
-
A. N. Nazarov, I. Ferain, N. D. Akhavan, P. Razavi, R. Yu, and J. P. Colinge, Appl. Phys. Lett. 98, 092111 (2011). 10.1063/1.3557505
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 092111
-
-
Nazarov, A.N.1
Ferain, I.2
Akhavan, N.D.3
Razavi, P.4
Yu, R.5
Colinge, J.P.6
-
17
-
-
80052103381
-
-
10.1063/1.3626038
-
A. N. Nazarov, I. Ferain, N. D. Akhavan, P. Razavi, R. Yu, and J. P. Colinge, Appl. Phys. Lett. 99, 073502 (2011). 10.1063/1.3626038
-
(2011)
Appl. Phys. Lett.
, vol.99
, pp. 073502
-
-
Nazarov, A.N.1
Ferain, I.2
Akhavan, N.D.3
Razavi, P.4
Yu, R.5
Colinge, J.P.6
-
18
-
-
78651343244
-
-
10.1063/1.3535958
-
N. Clément, K. Nishiguchi, J.-F. Dufrêche, D. Guérin, A. Fujiwara, and D. Vuillaume, Appl. Phys. Lett. 98, 014104 (2011). 10.1063/1.3535958
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 014104
-
-
Clément, N.1
Nishiguchi, K.2
Dufrêche, J.-F.3
Guérin, D.4
Fujiwara, A.5
Vuillaume, D.6
-
19
-
-
77949275137
-
-
10.1038/nnano.2010.15
-
J.-P. Colinge, C.-W. Lee, A. Afzalian, N. D. Akhavan, R. Yan, P. Razavi, B. O'Neill, A. Blake, M. White, A.-M. Kelleher, B. McCarthy, and R. Murphy, Nat. Nanotechnol. 5, 225 (2010). 10.1038/nnano.2010.15
-
(2010)
Nat. Nanotechnol.
, vol.5
, pp. 225
-
-
Colinge, J.-P.1
Lee, C.-W.2
Afzalian, A.3
Akhavan, N.D.4
Yan, R.5
Razavi, P.6
O'Neill, B.7
Blake, A.8
White, M.9
Kelleher, A.-M.10
McCarthy, B.11
Murphy, R.12
-
20
-
-
0012278046
-
-
10.1080/00018738900101122
-
M. J. Kirton and M. J. Uren, Adv. Phys. 38, 367 (1989). 10.1080/00018738900101122
-
(1989)
Adv. Phys.
, vol.38
, pp. 367
-
-
Kirton, M.J.1
Uren, M.J.2
-
21
-
-
36849124063
-
-
10.1063/1.1721637
-
S. Machlup, J. Appl. Phys. 25, 341 (1954). 10.1063/1.1721637
-
(1954)
J. Appl. Phys.
, vol.25
, pp. 341
-
-
Machlup, S.1
-
23
-
-
0024703054
-
-
10.1016/0038-1101(89)90113-5
-
G. Ghibaudo, Solid-State Electron. 32, 563 (1989). 10.1016/0038-1101(89) 90113-5
-
(1989)
Solid-State Electron.
, vol.32
, pp. 563
-
-
Ghibaudo, G.1
-
25
-
-
24544459259
-
-
10.1016/0375-9601(69)90076-0
-
F. N. Hooge, Phys. Lett. A 29, 139 (1969). 10.1016/0375-9601(69)90076-0
-
(1969)
Phys. Lett. A
, vol.29
, pp. 139
-
-
Hooge, F.N.1
-
27
-
-
77951877916
-
-
10.1109/LED.2010.2043637
-
K.-M. Persson, E. Lind, A. W. Dey, C. Thelander, H. Sjöland, and L.-E. Wernersson, IEEE Electron Device Lett. 31, 428 (2010). 10.1109/LED.2010.2043637
-
(2010)
IEEE Electron Device Lett.
, vol.31
, pp. 428
-
-
Persson, K.-M.1
Lind, E.2
Dey, A.W.3
Thelander, C.4
Sjöland, H.5
Wernersson, L.-E.6
-
28
-
-
0025508097
-
-
10.1109/16.59916
-
M. Peransin, P. Vignaud, D. Rigaud, and L. K. J. Vandamme, IEEE Trans. Electron Devices 37, 2250 (1990). 10.1109/16.59916
-
(1990)
IEEE Trans. Electron Devices
, vol.37
, pp. 2250
-
-
Peransin, M.1
Vignaud, P.2
Rigaud, D.3
Vandamme, L.K.J.4
-
29
-
-
33846862006
-
-
10.1021/nl062141q
-
J. Tersoff, Nano Lett. 7, 194 (2007). 10.1021/nl062141q
-
(2007)
Nano Lett.
, vol.7
, pp. 194
-
-
Tersoff, J.1
-
30
-
-
84856969577
-
-
10.1021/nl203701g
-
A. D. Franklin, M. Luisier, S.-J. Han, G. Tulevski, C. M. Breslin, L. Gignac, M. S. Lundstrom, and W. Haensch, Nano Lett. 12, 758 (2012). 10.1021/nl203701g
-
(2012)
Nano Lett.
, vol.12
, pp. 758
-
-
Franklin, A.D.1
Luisier, M.2
Han, S.-J.3
Tulevski, G.4
Breslin, C.M.5
Gignac, L.6
Lundstrom, M.S.7
Haensch, W.8
-
32
-
-
84891617702
-
-
(IEEE)
-
F. Martinez, S. Soliveres, C. Leyris, and M. Valenza, in IEEE ICMTS Proceedings (IEEE, 2006), p. 193.
-
(2006)
IEEE ICMTS Proceedings
, pp. 193
-
-
Martinez, F.1
Soliveres, S.2
Leyris, C.3
Valenza, M.4
-
33
-
-
36049041246
-
-
10.1103/PhysRevB.76.205407
-
N. Clément, S. Pleutin, O. Seitz, S. Lenfant, and D. Vuillaume, Phys. Rev. B 76, 205407 (2007). 10.1103/PhysRevB.76.205407
-
(2007)
Phys. Rev. B
, vol.76
, pp. 205407
-
-
Clément, N.1
Pleutin, S.2
Seitz, O.3
Lenfant, S.4
Vuillaume, D.5
-
34
-
-
84880970042
-
Investigation of single-trap-induced random telegraph noise for tunnel FET Based devices, 8t sram cell, and sense amplifiers
-
Monterey, CA, USA, April
-
M.-L. Fan, V. P.-H. Hu, Y.-N. Chen, P. Su, and C.-T. Chuang, " Investigation of single-trap-induced random telegraph noise for tunnel FET Based devices, 8t sram cell, and sense amplifiers.," in Proceedings of the 2013 IEEE International Reliability Physics Symposium (IRPS), Monterey, CA, USA, April 2013.
-
(2013)
Proceedings of the 2013 IEEE International Reliability Physics Symposium (IRPS)
-
-
Fan, M.-L.1
Hu, V.P.-H.2
Chen, Y.-N.3
Su, P.4
Chuang, C.-T.5
-
35
-
-
84858333987
-
-
10.1016/j.susc.2012.01.021
-
X. L. Han, G. Larrieu, E. Dubois, and F. Cristiano, Surf. Sci. 606, 836 (2012). 10.1016/j.susc.2012.01.021
-
(2012)
Surf. Sci.
, vol.606
, pp. 836
-
-
Han, X.L.1
Larrieu, G.2
Dubois, E.3
Cristiano, F.4
-
36
-
-
84858247431
-
-
10.1021/nl204088b
-
Y. Wu, V. Perebeinos, Y.-M. Lin, T. Low, F. Xia, and P. Avouris, Nano Lett. 12, 1417 (2012). 10.1021/nl204088b
-
(2012)
Nano Lett.
, vol.12
, pp. 1417
-
-
Wu, Y.1
Perebeinos, V.2
Lin, Y.-M.3
Low, T.4
Xia, F.5
Avouris, P.6
-
37
-
-
34547268597
-
Experimental evidence of short-channel electron mobility degradation caused by interface charges located at the gate-edge of triple-gate finFETs
-
Shanghai, China, 23-26 October
-
J. Ramos, E. Augendre, A. Kottantharayil, A. Mercha, E. Simoen, M. Rosmeulen, S. Severi, C. Kerner, T. Chiarella, A. Nackaerts, I. Ferain, T. Hoffmann, M. Jurczak, and S. Biesemans, " Experimental evidence of short-channel electron mobility degradation caused by interface charges located at the gate-edge of triple-gate finFETs.," in Proceedings of the 8th International Conference on Solid-State and Integrated-Circuit Technology, Shanghai, China, 23-26 October 2006.
-
(2006)
Proceedings of the 8th International Conference on Solid-State and Integrated-Circuit Technology
-
-
Ramos, J.1
Augendre, E.2
Kottantharayil, A.3
Mercha, A.4
Simoen, E.5
Rosmeulen, M.6
Severi, S.7
Kerner, C.8
Chiarella, T.9
Nackaerts, A.10
Ferain, I.11
Hoffmann, T.12
Jurczak, M.13
Biesemans, S.14
-
38
-
-
39549118360
-
-
K. Huet, J. Saint-Martin, A. Bournel, S. Galdin-Retailleau, P. Dollfus, G. Ghibaudo, and M. Mouis, in Proceedings of Solid State Device Research Conference, ESSDERC (2007), p. 382.
-
(2007)
Proceedings of Solid State Device Research Conference, ESSDERC
, pp. 382
-
-
Huet, K.1
Saint-Martin, J.2
Bournel, A.3
Galdin-Retailleau, S.4
Dollfus, P.5
Ghibaudo, G.6
Mouis, M.7
-
39
-
-
84874340355
-
-
J. Zheng, L. Wang, Q. Quhe, Q. Liu, H. Li, D. Yu, W. N. Mei, J. Shi, Z. Gao, and J. Lu, Sci. Rep. 3, 1314 (2013).
-
(2013)
Sci. Rep.
, vol.3
, pp. 1314
-
-
Zheng, J.1
Wang, L.2
Quhe, Q.3
Liu, Q.4
Li, H.5
Yu, D.6
Mei, W.N.7
Shi, J.8
Gao, Z.9
Lu, J.10
-
41
-
-
70350054841
-
-
10.1109/TED.2009.2028382
-
C. Buran, M. G. Pala, M. Bescond, M. Dubois, and M. Mouis, IEEE Trans. Electron Devices 56, 2186 (2009). 10.1109/TED.2009.2028382
-
(2009)
IEEE Trans. Electron Devices
, vol.56
, pp. 2186
-
-
Buran, C.1
Pala, M.G.2
Bescond, M.3
Dubois, M.4
Mouis, M.5
-
42
-
-
84863317067
-
-
T. Muramatsu, K. Miura, Y. Shiratori, Z. Yatabe, and S. Kasai, Jpn. J. Appl. Phys., Part 1 51, 06FE18 (2012).
-
(2012)
Jpn. J. Appl. Phys., Part 1
, vol.51
-
-
Muramatsu, T.1
Miura, K.2
Shiratori, Y.3
Yatabe, Z.4
Kasai, S.5
-
43
-
-
84881597059
-
-
10.1021/nl4019879
-
N. Clément, K. Nishiguchi, J.-F. Dufrêche, D. Guérin, A. Fujiwara, and D. Vuillaume, Nano Lett. 13, 3903 (2013). 10.1021/nl4019879
-
(2013)
Nano Lett.
, vol.13
, pp. 3903
-
-
Clément, N.1
Nishiguchi, K.2
Dufrêche, J.-F.3
Guérin, D.4
Fujiwara, A.5
Vuillaume, D.6
|