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Volumn 98, Issue 1, 2011, Pages

A silicon nanowire ion-sensitive field-effect transistor with elementary charge sensitivity

Author keywords

[No Author keywords available]

Indexed keywords

1/F NOISE; CHARGE NOISE; DIELECTRIC POLARIZATION; ELECTRICAL DETECTION; ELEMENTARY CHARGE; LOW-FREQUENCY NOISE; MINIMAL EFFECTS; NANO SCALE; NOISE LEVELS; SILICON NANOWIRE FIELD-EFFECT TRANSISTORS; SILICON NANOWIRES;

EID: 78651343244     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3535958     Document Type: Article
Times cited : (70)

References (21)
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    • See supplementary material at E-APPLAB-98-017102 for device fabrication, calibration with Ag/AgCl reference electrode, fits of (I- Vbg) curves, noise post treatment of data and extended discussion, and single electron trapping demonstration
    • See supplementary material at http://dx.doi.org/10.1063/1.3535958 E-APPLAB-98-017102 for device fabrication, calibration with Ag/AgCl reference electrode, fits of (I- Vbg) curves, noise post treatment of data and extended discussion, and single electron trapping demonstration.
  • 14
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    • (to be published)
    • N. Clement, K. Nishiguchi, A. Fujiwara, and D. Vuillaume, " Evaluation of a gate capacitance in the subattofarad range for a chemical field-effect transistor with a silicon nanowire channel.," IEEE Trans. Nanotechnol. (to be published).
    • IEEE Trans. Nanotechnol.
    • Clement, N.1    Nishiguchi, K.2    Fujiwara, A.3    Vuillaume, D.4
  • 17
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.